Growth of large area YBa/sub 2/Cu/sub 3/O/sub 7-x/ thin film by cylindrical hollow cathode sputtering

We have deposited large area YBa/sub 2/Cu/sub 3/O/sub 7-x/ thin films by cylindrical hollow cathode sputtering using a 9 cm diameter hollow cathode sputtering gun. The zero resistance temperature of the films at the center and edge were in the range from 86 K to 83 K. X-ray diffraction analysis and scanning electron micrographs showed that the films are completely c-axis oriented. The variation of the thickness was less than 5% over the whole substrate. The values of microwave surface resistance were 1 m/spl Omega/ at 25 K and 40 m/spl Omega/ at 77 K and 19.6 GHz.