High performance sputtered carbon coatings for wear resistant applications

1999 
Abstract The Closed Field Un-Balanced Magnetron Sputter Ion Plating (CFUBMSIP) process is now routinely used in a production environment and is characterised by a high degree of flexibility in terms of the substrates and coating materials which can be used. Compared to classical magnetron sputtering the closed field system produces higher ion current density which gives high quality coatings and excellent adhesion. The ability to vary the deposition parameters over a wide range, permits the modification of not only the composition and the structure but also the morphology (density and growth mode) of the films. This paper describes, that in particular, a range of carbon coatings from transparent, electrically insulating to black, conductive coatings, can be produced. Tribological tests concerning adherence, hardness and wear properties in atmospheric and lubricated conditions are presented. The effects of the nature of the substrates with different hardness properties (M42, stainless steel and Al) are investigated.
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