Application of dilute boron B(Al,In,Ga)N alloys for UV light sources

In the last decades, development of the (Al,Ga,In)N materials has led to new generations of opto- and micro-electronic devices. More recently, novel B(Al,Ga,In)N alloys have been proposed for optical applications in the UV range. Since material containing boron possesses unique properties, the B(Al,Ga,In)N materials system is expected to permit the design of improved and/or novel devices. To evaluate this potential, an improved knowledge of the physical properties of these new materials will be required, however. In this work, investigation of optical, structural, and compositional properties of low-boron content BGaN and BAlN ternary and BInGaN quaternary materials grown through Metalorganic Vapor Phase Epitaxy (MOVPE) are presented. It is shown that inclusion of a small amount of boron strongly affects the optical properties allowing the fabrication of BGaN-based Distributed Bragg Reflectors (DBRs) or Distributed Bragg Confinement layers (DBCs) with large refractive index contrast. Indeed, 1% of boron in BGaN/GaN multilayer structures gives a refractive index contrast of more than 0.1, which is equivalent to that of AlGaN/GaN containing 22% aluminum. The potential of boron-based material technology is illustrated for visible range solar cells applications through the example of BInGaN with good crystalline quality grown on ZnO buffered silicon substrates. It was found that through boron introduction, reduced lattice mismatch, and thus reduced tensile strain, could be obtained for high In contents.