Study of lamellar multilayer grating near B K-edge and Si L-edge

We present an efficient design of lamellar multilayer grating (LMG) for the extreme ultraviolet/soft X-ray region near both the Si L-edge and B K-edge. The designs of LMGs have been performed by exploring different materials combinations, which are capable of providing high resolution and peak reflectivity. The performance analysis of the designed LMGs is made analytically using the coupled wave theory for single-order regime. That provides an estimation of diffraction efficiency and resolution. The effect of structural imperfections such as tapering of the lamellar profile and interfacial width on the optical properties are also analysed to describe non-ideal LMG structures.