Old Web
English
Sign In
Acemap
>
Paper
>
Preparation of SiC thin films by ion beam technology and PECVD
Preparation of SiC thin films by ion beam technology and PECVD
1998
Chen Changqing
Ren Congxin
Yang Lixin
Yan Jinlong
Zheng Zhihong
Zhou Zuyao
Chen Ping
Liu Xianghuai
Chen Xueliang
Keywords:
surface coating
Plasma-enhanced chemical vapor deposition
Ion implantation
Ion beam
Materials science
Thin film
Chemical vapor deposition
Optoelectronics
Carbide
Sputtering
Correction
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]