Bound PAG resists: an EUV and electron beam lithography performance comparison of fluoropolymers
2011
One of the most promising resist design strategies for the development of high resolution materials for EUV
lithography is the PAG anion-bound polymer approach. We have published several reports in the past
few years on the structure/property relationships of anion bound PAG resist polymers. This paper will
focus on relative performance of novel bound PAG polymers in EUV and electron beam lithographies. We
will analyze the performance characteristics of a series of well characterized bound PAG resist polymers
using several polymerizable PAG monomers. Due to the limited access to EUV exposure tools, we
analyzed the initial lithographic performance with electron beam lithography for improved cycles of
learning. We have found several examples of poor correlation between EUV and e-beam (EB) lithography
results. We will offer rational for the difference in performance, with the goal of improved insight into both
EB and EUV resist design.
Keywords:
- Correction
- Source
- Cite
- Save
- Machine Reading By IdeaReader
0
References
8
Citations
NaN
KQI