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Chemical Vapor Deposition of Silicon Nitride Films Enhanced by Surface-Wave Plasma and Electron Device Application
Chemical Vapor Deposition of Silicon Nitride Films Enhanced by Surface-Wave Plasma and Electron Device Application
2014
Kawakami Kyohei
Ishimaru Takahiro
Shinohara Masatoshi
Okada Hiroshi
Furukawa Masakzu
Wakahara Akihiro
Sekiguchi Hiroto
Keywords:
Chemical vapor deposition
Silicon nitride
Optoelectronics
Plasma
Surface wave
Electron
Materials science
algan gan
electron device
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