Pellicle degradation and its effect on surrounding environment in ArF lithography

We investigated pellicle degradation during ArF laser irradiation and its effect on a substrate. The chemical structure of the pellicle film was not changed but its molecular weight decreased. F and C were observed on the substrate surface after irradiation. The source of the contamination was apparently film evaporation caused by ArF laser irradiation. Further experiments under conventional conditions, not accelerated conditions, will be necessary.