Electron-beam lithography of optical elements for x-ray range (Poster Paper)

Experimental investigations and special software for the e-beam exposure system gives the possibility of decreasing the influence of proximity effects and field distortion. The results of creating a focusing element for the soft x-ray range are described: amplitude and phase- contrast Fresnel zone plates as well as reflected Bragg-Fresnel lenses on the base of multilayer x-ray mirrors.