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Study on spin-on antireflective coatings for thinner resist process in deep UV lithography
Study on spin-on antireflective coatings for thinner resist process in deep UV lithography
2004
yasuhiko satou
Keywords:
X-ray lithography
Photolithography
Spin-½
Anti-reflective coating
Optics
Materials science
Resist
Optoelectronics
Correction
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