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Highly Resistive AlN Formation in TiN / AlCu / TiN Stack Evidenced by EELS TEM and XPS
Highly Resistive AlN Formation in TiN / AlCu / TiN Stack Evidenced by EELS TEM and XPS
2010
Bruno Delahaye
H. Fray
J.P. Brun
N. Guilbaud
P. Tabary
S. Lariviere
D. Basso
M Modi
M. Idir
Keywords:
Tin
Resistive touchscreen
X-ray photoelectron spectroscopy
Chemical engineering
Materials science
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