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Understanding of residues growth on TiN hard mask after etching in fluorocarbon-based plasmas
Understanding of residues growth on TiN hard mask after etching in fluorocarbon-based plasmas
2008
Nicolas Posseme
R. Bouyssou
Thierry Chevolleau
T David
Vincent Arnal
C. Verove
Olivier Joubert
Keywords:
Etching
Fluorocarbon
Plasma
Optoelectronics
Tin
hard mask
Materials science
Correction
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