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Evaluation of low-temperature deposition process of SiGeHEMT by Sputter Epitaxy Method
Evaluation of low-temperature deposition process of SiGeHEMT by Sputter Epitaxy Method
2017
Katsumi Okubo
Motohashi Akira
Degura Kyouhei
Hirose Nobumitsu
Kasamatsu Akifumi
Matsui Toshiaki
Tsukamoto Takahiro
Suda Yoshiyuki
Keywords:
Sputtering
Epitaxy
High-electron-mobility transistor
Optoelectronics
Materials science
low temperature deposition
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