Phase selection in magnetron sputter-deposited TiAl alloy

Abstract Microstructural evolution in an amorphous Ti–50 at.% Al deposit, which was produced by magnetron sputter deposition, has been studied. At low temperatures the α phase and hence the α 2 phase preceded the equilibrium γ phase during isothermal annealing. Phase selection during annealing of the amorphous film is discussed using thermodynamic modelling and nucleation theory.