Illumination optics design for EUV lithography

In this paper, a comparison of two different solutions for the illuminator is presented. The systems are intended to comply with the illumination requirements, but have different advantages and drawbacks. The examples represent solutions based on conical reflection and on a fly's-eye integrator. A comparison is given and the potentials of the different solutions are outlined.© (2000) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.