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Potential sputtering of LiF and SiC under bombardment by Ar q+ (q = 1-6) multicharged ions
Potential sputtering of LiF and SiC under bombardment by Ar q+ (q = 1-6) multicharged ions
2005
B. G. Atabaev
Keywords:
Ion implantation
Analytical chemistry
Kinetic energy
Charged particle
Compounds of carbon
Materials science
Carbide
Sputtering
Potential energy
Ion
Correction
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