Need for comprehensive reticle data management and analytics

With the increase of critical data generated during advanced reticle development and manufacturing, a centralized data management and analytics solution is needed to perform comprehensive analytics like defect source analysis, across-process correlations and root-cause analysis of deviations and excursions. Combining defect and metrology data analysis, such a system needs to incorporate the variety of mask-shop tool data along with computational applications being used and connect with other existing equipment and manufacturing databases in real-time. This paper discusses the needs, requirements and benefits derived from such a centralized mask data management solution and the successful deployment of KLA’s KlearView product for this purpose into high-volume mask manufacturing.