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TOFSIMS evaluation of the removal of resists on silicon by ozone-based cleaning
TOFSIMS evaluation of the removal of resists on silicon by ozone-based cleaning
2000
Thierry Conard
Conny Kenens
Stefan De Gendt
Martine Claes
Sébastien Lagrange
W WorthA
Wilfried Vandervorst
Keywords:
Environmental chemistry
Silicon
Ozone
Resist
Materials science
Chemical engineering
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