Changes in the composition and optical properties of Cu and Cu 2 O nanofilms deposited on SiO 2 substrates after annealing and bombardment by argon and hydrogen ions

Copper films with a thickness of 10, 15, 27, and 45 nm deposited on quartz glass substrates are oxidized in an air flow at different temperatures. The compositions of the films are determined by X-ray photoelectron spectroscopy and calculated from the optical absorption spectra using an original method developed by us. The influence of the bombardment of the samples by argon and hydrogen ions on the optical properties and composition of the films is studied. The experimental depth of Cu2O film reduction is three times higher than the calculated penetration depth of H+ ions. The rate of film sputtering by H+ ions with the energy 300 eV increases with an increase in the film thickness due to the loose structure of the oxidized layer.l