Pulsed Magnetron Sputtering Deposition of DLC Films Part I

Pulsed magnetron sputtering of graphite target was employed for deposition of diamond-like carbon (DLC) films. Time-resolved probe measurements of magnetron discharge plasma have been performed. It was shown that the pulsed magnetron discharge plasma density (~10¹?m?³) is close to that of vacuum arc cathode sputtering of graphite. Raman spectroscopy was used to examine DLC films produced at low (U sub c = 100 eV. In spite of rather high percentage of sp3-bonded carbon atoms and good scratch-resistance, the films showed poor adhesion because of absence of ion mixing between the film and the substrates. Electric breakdowns occurring during the deposition of the insulating DLC film. also thought to decrease its adhesion.