Removal of pyramidal germanium nanoislands from the silicon (001) surface as a result of deposition/sputtering of a gold nanolayer
2004
Optimal conditions for selective removal of pyramidal germanium nanoislands from the silicon (001) surface by sequential ion-beam deposition/sputtering of a gold layer with a nanoscale thickness are determined experimentally; it is important that the sizes of large domelike germanium nanoislands change only slightly as a result of the ion-beam treatment.
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