Manufacturing method of gadolinium-made sputtering target and the target

[Abstract] The assembly of the gadolinium target and titanium backing plate, the bonding interface between the gadolinium target and titanium backing plate, gadolinium target and titanium backing characterized by having a solid phase diffusion bonding interface plate assembly. With finding the matching backing plate gadolinium made sputtering target, and searches for an optimum bonding conditions, to stabilize the sputtering improves the deposition rate, the target material and the backing plate to increase the bonding strength of the target material and the backing plate of preventing occurrence or peeling of the warp, it is an object to suppress the generation of particles during sputtering.