Structure and properties of ion-plasma deposited Ni-C films in a metastable state

A modified ion-plasma sputtering technique was used to produce metastable states, in particular, amorphous (from the standpoint of X-ray diffraction) and nanocrystaline phases in nickel-carbon film alloys in a wide composition range from 7 to 61.4 at. % C. Short-range order parameters of amorphous phases and lattice parameters of metastable phases were determined; the sequential formation and transformation of intermediate phases during the transition of the Ni-C alloys into the equilibrium state are studied. Electrical properties of the deposited alloys in different states were measured; the results obtained are explained.