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Prospect of Hf-based Gate Dielectric by PVD with FUSI Gate for LSTP Application
Prospect of Hf-based Gate Dielectric by PVD with FUSI Gate for LSTP Application
2006
Masaaki Niwa
R. Mitsuhashi
Shigenori Hayashi
K. Yamamoto
Yoshinao Harada
Masafumi Kubota
Aude Rothchild
Thomas Hoffmann
S. Kubicek
S. De Gendt
Marc Heyns
Anne Lauwers
S. Biesemans
Jorge Kittle
Keywords:
Gate dielectric
Electronic engineering
Materials science
Optoelectronics
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