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Plasma enhanced chemical vapor deposition of SiO 2 using novel alkoxysilane precursors
Plasma enhanced chemical vapor deposition of SiO 2 using novel alkoxysilane precursors
1995
K. H. A. Bogart
Nathan F. Dalleska
G. R. Bogart
Ellen R. Fisher
Keywords:
Materials science
Chemical engineering
Plasma-enhanced chemical vapor deposition
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