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Extending photo-patternable low-kappa concept to 193nm lithography and e-beam lithography
Extending photo-patternable low-kappa concept to 193nm lithography and e-beam lithography
2011
Qinghuang Lin
Drew V. Nelson
Luisa D. Bozano
Phillip J. Brock
Suzanne A. Cohen
Elizabeth Davis
Raymond H.-S. Kwong
E. Liniger
Deborah A. Neumayer
Jitendra S. Rathore
Hosadurga Shobha
Ratnam Sooriyakumaran
Sampath Purushothaman
Robert C. Miller
Robert B. Allen
Terry A. Spooner
Robert L. Wisnieff
Keywords:
X-ray lithography
Photolithography
Electron-beam lithography
Next-generation lithography
Lithography
Extreme ultraviolet lithography
Optics
Materials science
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