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Optimization of x-ray lithography conditions for fabrication of large arrays of high-aspect-ratio submicron pores
Optimization of x-ray lithography conditions for fabrication of large arrays of high-aspect-ratio submicron pores
2021
Vladimir Nazmov
B.G Goldenberg
Alexander Vasiliev
Viktor Asadchikov
Keywords:
Optoelectronics
Fabrication
X-ray lithography
Materials science
Correction
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