Device Fabrication—An Example

This chapter presents a case of an actual MEMS device fabrication. The example chosen is an electromagnetic levitation (maglev ) system consisting of a stator and a traveler. Due to the high aspect ratio of some of the structures involved, the system may be considered to represent HARMST technology. Stator and traveler are fabricated on separate substrates. The technologies involved are deposition, etching, photolithography, and planarization. Deposition processes applied are sputtering, PECVD, and electrochemical processes. The etching processes used are IBE and wet-chemical etching. Photolithography is conducted with positive, image reversal, and negative resists. Planarization employs CMP.