Deep pot-shaped copper sputtering target

A copper sputtering target depth pan-like manufactured by die forging, the deep pan shaped all Vickers hardness Hv of 70 or more is deep pan-shaped copper sputtering target at the location of the target inner surface. The depth pot-shaped copper sputtering target average crystal grain size in the target tissue is equal to or less than 65 .mu.m. Deep pan shaped targets inside surface is obtained by X-ray diffraction (220), (111), (200), the crystal orientation has a crystal orientation of the surface receiving the erosion of the deep pan-shaped target (311) There (220) deep pot-shaped copper sputtering target is the main orientation. By improving-devised forging process and heat treatment process, and problems that the crystal grain size to a fine and uniform, methods and thereby superior sputtering target can be stably produced characteristic obtaining a sputtering target having excellent quality to.