The influence of deposition parameters on room temperature ozone sensing properties of InOx films

Abstract Indium oxide films with a thickness of 100 nm were deposited onto Corning 7059 glass substrates at room temperature. The films were prepared by the dc magnetron sputtering technique using a variety of sputtering powers and sputtering atmospheres. The structural parameters of the films as determined by XRD analysis and the optical band gap were found to be dependent on the sputtering power during their preparation. The ozone sensing properties of the indium oxide films were investigated following an activation with UV light and as a result a sensitivity of 10 5 to 10 6 was achieved. For films sputtered with a deposition rate of 0.4 A/s and with 100% oxygen in plasma during the sputtering process, the highest sensitivity was achieved.