Feedforward temperature control of the plasma processing apparatus

The temperature of the plasma processing chamber, a method and system for controlling a short controller response time and high stability is provided. Temperature control is based at least in part on the feed forward control signal derived from the plasma power input to the process chamber. Feedforward control signal is intended to compensate for disturbances in temperature due to the plasma power, it can be combined with a feedback control signal to cancel the error between the measured temperature and the desired temperature. .FIELD 1