Properties of CrN thin films deposited in plasma-activated ABS by reactive magnetron sputtering

Abstract In this work, magnetron sputtered CrN x thin films with nitrogen concentrations ranging from 17 to 30 at.% were deposited on plasma activated ABS. Two sets of thin films were obtained by varying the N 2 flow inside the vacuum chamber (series #1) and the deposition time (series #2). The polymer samples were also subjected to plasma treatment in Ar prior to the CrN x thin films' deposition, in order to enhance the adhesion. The fundamental microstructural, chemical and physical properties, as well as the electrochemical and adhesion behavior of the CrN x thin films, were assessed by SEM, XRD, 3D profilometry, RAMAN, colorimetry, OCP measurements and cross-cut tape test. Main results show that high-quality CrN x films with a low percentage of defects were obtained. The CrN x film sputtered with 3 sccm N 2 for 20 min was considered to possess the most appropriate brightness, color, electrochemical stability and interfacial adhesion to fit the end-user requirements. Magnetron sputtering is thus a promising alternative to the hazardous chrome plating for an effective metallization of ABS.