Photometric calibration of an in situ broadband optical thickness monitoring of thin films in a large vacuum chamber

To improve the in situ monitoring of thin films at the Laboratoire des Materiaux Avances, a broadband optical monitoring of the coated thin films was developed and installed in the biggest ion-beam sputtering machine in the world. Due to the configuration of the coating machine and the chamber strain under vacuum, a standard calibration procedure is impossible and a double-beam optical system is not suitable. A novel theoretical and practical solution to calibrate the measurements was found and is described in this paper. Some relevant results achieved thanks to this technique are discussed as well.