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Real-time feedback control of reactive ion etching of amorphous silicon for thin film transistor fab
Real-time feedback control of reactive ion etching of amorphous silicon for thin film transistor fab
1994
John S. Herman
Tyrone E. Benson
Oliver D. Patterson
Yung Chen Chun
Alex T. Demos
Pramod P. Khargonekar
Fred L. Terry
Michael E. Elta
Keywords:
Amorphous silicon
Electronic engineering
Composite material
Thin-film transistor
Reactive-ion etching
Oxide thin-film transistor
Etching (microfabrication)
Materials science
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