SiO2-P2O5-HfO2-Al2O3-Na2O glasses activated by Er3+ ions: From bulk sample to planar waveguide fabricated by rf-sputtering

Abstract 0.4 Er 3+ -doped 90.7 SiO 2 – 4.4 P 2 O 5 – 2.3 HfO 2 – 1.7 Al 2 O 3 – 0.7 Na 2 O planar waveguide was fabricated by multi-target rf-sputtering technique starting by massive Er 3+ -activated P 2 O 5 -SiO 2 -Al 2 O 3 -Na 2 O glass. The optical parameters were measured by m-line apparatus operating at 632.8, 1319 and 1542 nm. The waveguide compositions were investigated by Energy Dispersive X-ray Spectroscopy and its morphology analyzed by Atomic Force Microscopy. The waveguide exhibits a single propagation mode at 1319 and 1542 nm with an attenuation coefficient of 0.2 dB/cm in the infrared. The emission of 4 I 13/2  →  4 I 15/2 transition of Er 3+ ion, with a 28.5 nm bandwidth was observed upon TE 0 mode excitation at 514.5 nm. The optical and spectroscopic features of the Er 3+ -activated parent P 2 O 5 -SiO 2 -Al 2 O 3 -Na 2 O glass were also investigated.