Ion sputtering rates of C, CrxCy, and Cr at different Ar+ ion incidence angles

Abstract To study the ion sputtering of a layered structure with different layer densities and ion sputtering yields a trilayer structure of C-graphite(46 nm)/Cr x C y (60 nm)/Cr(69 nm) was sputter deposited onto smooth silicon substrates. The ion sputtering rates of amorphous carbon, amorphous Cr x C y and polycrystalline Cr were determined by means of Auger electron spectroscopy depth profiling as a function of the angle of incidence of two symmetrically inclined 1 keV Ar + ion beams in the range between 22° and 82°. The sputtering rates were calculated from the known thicknesses of the layers and the sputtering times necessary to remove the individual layers. It was found that the sputtering rates of C-graphite, Cr x C y carbide and Cr were strongly angle dependent. The experimental sputtering yields were in agreement with the theoretical results obtained by calculation of the transport of ions in solids, but the sputtering yields of C-graphite measured at ion incidence angles larger than 29° were smaller than the simulated ones.