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Multi-Beam Concepts for Nanometer Devices : Lithography Technology
Multi-Beam Concepts for Nanometer Devices : Lithography Technology
1989
Burkhard Lischke
W. Bennecke
M. Brunner
A. Heuberger
E. Knapek
P. Schäffer
Uwe Schnakenberg
Keywords:
Nanotechnology
X-ray lithography
Nanometre
Stencil lithography
Beam (structure)
Electron-beam lithography
Maskless lithography
Lithography
Computational lithography
Materials science
multi beam
Correction
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