Optimization of TaSix absorber stack for EUV mask
2006
We evaluated and optimized Ta-based absorber added by Si for EUV mask. Consequently, we
confirmed TaSix based bi-layer absorber stack has the following performances; It has amorphous
morphology without columnar structure advantageous to fabricate fine pattern with smaller line edge
roughness. In order to realize better position accuracy, it has low internal stress capable to control.
As an optical property, it has low DUV reflectance at 257nm which facilitates to perform defect
inspection. As it can be etched anisotropcally by conventional halogen gases without using hard
mask, we achieved almost vertical sidewall profile of 120nm lines and spaces pattern and promising
CD control accuracy.
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