Non-Destructive Characterisation of Rapid Thermally Annealed N+-Doped Polysilicon Using Spectroscopic Ellipsometry

The use of spectroscopic ellipsometry (SE) to characterise the effects of rapid thermal annealing on Si implanted with phosphorous and phosphorous with fluorine are presented. Variations in the measured SE spectra with anneal temperature and presence/absence of fluorine are clearly observed. Spectra are successfully modelled using refractive indices which are graded with depth. Comparison with cross-sectional transmission-electron microscopy and secondary ion mass spectroscopy show that the results can be correlated with both the crystallinity and impurity distribution in the poly-Si.