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Characteristics of in-situ chamber cleaning for DPS+ metal etcher by using optical emission spectroscopy
Characteristics of in-situ chamber cleaning for DPS+ metal etcher by using optical emission spectroscopy
2006
Yong-Hwan Ryu
Woojin Cho
Yongwoo Lee
Min-Chul Chae
Sung-Un Kwon
Jae-seung Hwang
Keywords:
Plasma processing
Plasma etcher
Analytical chemistry
Plasma etching
Inductively coupled plasma atomic emission spectroscopy
Materials science
Emission spectrum
Metal
Etching
In situ
optical emission spectroscopy
Correction
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