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Polishing effect of the plasma on the growth of YBa[sub 2]Cu[sub 3]O[sub 7−δ] films by radio frequency sputtering
Polishing effect of the plasma on the growth of YBa[sub 2]Cu[sub 3]O[sub 7−δ] films by radio frequency sputtering
2002
Hsiung Chou
Paul Lin
Charles C. Hsu
Tsun Chow
Hong Meng
Yi-Chang Chen
Jing-Rong Liu
T. P. Tsai
Keywords:
Sputtering
Polishing
Plasma
Analytical chemistry
Radio frequency
Inorganic chemistry
Chemistry
Correction
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