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Nanofabrication using a chloromethyl-calixarene negative resist in electron beam lithography
Nanofabrication using a chloromethyl-calixarene negative resist in electron beam lithography
2000
Takashi T. Sakamoto
Shoko Manako
Jun-Ichi Fujita
Yukinori Ochiai
Tomosumi Baba
Hisashi Yamamoto
Takanori Teshima
Keywords:
Electron-beam lithography
X-ray lithography
Nanolithography
Photolithography
Stencil lithography
Photoresist
Next-generation lithography
Analytical chemistry
Maskless lithography
Materials science
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