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Counter-facing Plasma Focus System for Efficient Extreme-Ultra-Violet Plasma Light Source
Counter-facing Plasma Focus System for Efficient Extreme-Ultra-Violet Plasma Light Source
2010
Kenji Hayashi
Yusuke Kuroda
Hajime Kuwabara
Mitsuo Nakajima
Kazuhiko Horioka
Keywords:
Optoelectronics
Plasma
Dense plasma focus
Optics
Lithography
Materials science
light source
ultra violet
energy density
Correction
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