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Hajime Kuwabara

IHI Corporation

21

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29

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Evaluation of High Energy Density Plasma in Counter-Facing Plasma Focus Device Driven by Laser-Triggered Pulse Power System

2018 Electrical Engineering in Japan
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Laser-Assisted Counter-Facing Plasma Focus Device as a Light Source for EUV Lithography

2017 IEEE Transactions on Plasma Science
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Fundamental properties of the counter-facing plasma focus device for extreme ultra-violet light source

2017
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Demonstration of Rapid Electrical Recovery in Repetitive Operation of a Counter-Facing Plasma-Focus Device

2017 Plasma and Fusion Research
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Evaluation of High Energy Density Plasma in Counter-facing Plasma Focus Device driven by Laser Triggered Pulse Power System

2017 The transactions of the Institute of Electrical Engineers of Japan.A
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Development of counter-facing discharge device for extreme ultraviolet source. Evaluation of electrode damages for stationary operation

2017
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Power flow in counter-facing plasma guns for extreme ultra-violet plasma light source

2017
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Development of counter-facing discharge device for extreme ultraviolet source. Control of current waveform and its effects on the plasma dynamics

2017
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Repetitive operation of counter-facing plasma focus device: toward a practical light source for EUV lithography

2014 Proceedings of SPIE
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Counter-facing plasma guns for efficient extreme ultra-violet plasma light source

2013
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