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Atomic Layer Selective GaN/SiN Etching by HBr Neutral Beam
Atomic Layer Selective GaN/SiN Etching by HBr Neutral Beam
2021
Takahiro Sawada
Daisuke Ohori
Kenta Sugawara
Masaya Okada
Ken Nakata
Kazutaka Inoue
Daisuke Sato
Seiji Samukawa
Keywords:
Materials science
layer
Optoelectronics
Etching (microfabrication)
Beam (structure)
Correction
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