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Study of Ar and Cu Plasma in a Magnetic Field Enhanced rf Argon Plasma for Ionized Sputtering of Cu
Study of Ar and Cu Plasma in a Magnetic Field Enhanced rf Argon Plasma for Ionized Sputtering of Cu
1997
Wei Wang
J Foster
A. Wendt
J.H. Booske
S.S. Gearhart
N Hershkowitz
Keywords:
Ionization
Plasma
Sputtering
Argon
Materials science
Magnetic field
Analytical chemistry
Correction
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