Negative-Tone Molecular Resist with High-Sensitivity for EUV and EB Lithography

Results of another molecular design of the negative-tone molecular resist for improvement of sensitivity were discussed. Frictional force spectroscopy (FFS) was performed for investigating thermal property of resist films by a scanning probe microscope (SPM) with sweeping temperature. Depth profile of the resist components was measured by TOF-SIMS with gradient shaving preparation. EB lithographic characteristics of the resists were evaluated and EUV imaging was performed.