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Lithography process for KrF in the sub-0.11 μm node
Lithography process for KrF in the sub-0.11 μm node
2009
Yuhang Zhao
Jun Zhu
Jiarong Tong
Xuan Ceng
Keywords:
X-ray lithography
Lithography
Next-generation lithography
Optics
Extreme ultraviolet lithography
Materials science
Optoelectronics
lithography process
Correction
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