Yutaka Kaneko

Japan Broadcasting Corporation (Japan)

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Synergistic Effects of Additives on the Filling Process of High-Aspect-Ratio TSV - Kinetic Monte Carlo Simulation -

ECS Transactions (2013)

Yuki Fukiage Yutaka Kaneko Tarō Hayashi Kazuo Kondo Katsuhiko Ohara

The effects of additives on the filling process of high-aspect-ratio Through Silicon Via (TSV) have been studied by the kinetic Monte Carlo (KMC) simulation. We included accelerators, suppressors, and levelers in the solution. The synergistic effect of suppressors and levelers is taken into account. We used three kinds of waveforms of the applied current: the pulse current, the pulse reverse current, and the 2-step current (the combination of the pulse current and the pulse reverse current). We confirmed that the dependence of the filling pattern on the leveler concentration corresponds to the experimental results. It is found that the initial distribution of additives plays an important role in the filling. The dependence of filling efficiency on waveforms is also studied. We succeeded in the void-free filling of 12 aspect ratio via(10μm×120μm) by using 2-step current.

Aspect ratio (aeronautics)

Void (composites)

Kinetic Monte Carlo

Through-Silicon Via

10.1149/05032.0041ecst

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Citations (3)

DYNAMICS OF SUPERCOOLED BINARY LIQUIDS(Session III : Complex Fluids, The 1st Tohwa University International Meeting on Statistical Physics Theories, Experiments and Computer Simulations)

物性研究 (1996)

Yutaka Kaneko J. Bosse

Supercooling

Dynamics

Statistical Analysis

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Citations (0)

Viewing behavior on time-shift viewing with zapping along the on-air time axis

ITE Technical Report (2014)

Shinya Takeuchi Minsok Hwang Yutaka Kaneko Masahide Naemura

Viewing angle

Deep time

Time shifting

Source

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A MULTI-COLOR PROJECTION LCD

ITEJ Technical Report (1988)

Yutaka Kaneko M. Haraguchi Y. Koike Masashi Iwasaki Toshiaki Yoshihara

Source

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Simulation of Three-Dimensional Solid-by-Solid Model and Application to Electrochemical Engineering

Meeting abstracts/Meeting abstracts (Electrochemical Society. CD-ROM) (2010)

Yutaka Kaneko Yasuaki Hiwatari Katsuhiko Ohara Fujio Asa

Abstract not Available.

10.1149/ma2010-01/25/1244

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A Face Identification System Based on Self-Supervised Learning Using Triplet-based Variational Autoencoder

IEICE Technical Report; IEICE Tech. Rep. (2021)

Yuta Hagio Yutaka Kaneko Yuta Hoshi Marina Kamimura Yasuhiro Murasaki

Autoencoder

Identification

Source

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Jumbling - with special reference to Meyer zum Gottesberge's test -

Practica Oto-Rhino-Laryngologica (1984)

Tamio Kamei S. Takahashi Mitsuo Matsuzaki Masahiko Muroi Yoshihito Yasuoka

Source

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Citations (2)

Prediction models for retinopathy of prematurity using non-imaging machine-learning approaches: A regional multicenter study

Ophthalmology Science (2025)

Yusuke Takeda Yutaka Kaneko Masahiko Sugimoto Hidetoshi Yamashita Ayako Sasaki

10.1016/j.xops.2025.100715

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Molecular dynamics—Monte Carlo hybrid simulation of thin film growth and void formation in electrodeposition process

Molecular Simulation (2007)

Yasuaki Hiwatari Yutaka Kaneko Takashi Mikami Katsuhiko Ohara Fujio Asa

Abstract The surface structure and the void formation during electrodeposition process are investigated using the hybridized method of molecular dynamics and Monte Carlo simulations. In this approach, adsorption and desorption reactions are simulated by means of the Monte Carlo method within the molecular dynamics simulation of solution-electrode interface. The adsorption (desorption) is regarded as the change of metal ions (atoms) to metal atoms (ions). We performed the simulations of crystal growth on FCC (111) and (100) surfaces to study the surface structure depending upon the deposition conditions. The growth mechanism is discussed in relation to the surface diffusion of adatoms. In order to study the void formation in the deposition process, we performed the simulation of filling V-shaped grooves. It is shown that large voids appear in the middle of the grooves when they are filled with deposited atoms and some of the ions are embedded in the film. Keywords: ElectrodepositionMolecular dynamicsMonte CarloVoid formation Acknowledgements The authors would like to thank Dr T. Murakami of C. Uyemura & Co., Ltd for useful discussions. They are also grateful to Mr Y. Ueno and Mr T. Yokoyama of Kyoto University for their contribution in the early stage of this work.

Void (composites)

Surface diffusion

Kinetic Monte Carlo

Deposition

10.1080/08927020601052930

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Citations (8)

Computer simulation of electrodeposition: hybrid of molecular dynamics and Monte Carlo

Molecular Simulation (2004)

Yutaka Kaneko Takashi Mikami Yasuaki Hiwatari Katsuhiko Ohara

In this paper, we propose a hybrid method of molecular dynamics (MD) and Monte Carlo (MC) for the simulation of thin film growth with electrodeposition. In this method, we simulate the dynamics of particles by the MD method, while the reactions of the deposition are realized by the MC method. Two reactions are taken into account, that is, adsorption and desorption, which are treated as changes in the species of the particles. When adsorption occurs, one of the metal ions near the surface changes to a metal atom. Desorption is the reverse process. We performed the simulation using a simple model for the solution–electrode interface, consisting of metal atoms, metal ions, anions and solvent particles. The correlation between the surface structure and the deposition condition is investigated.

Deposition

10.1080/08927020412331332758

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Citations (9)