A current-mode output driver that supports SERDES applications is implemented using 0.13 mum Bulk and PD SOI CMOS technologies. Schematic simulation results confirm the enhanced performance of PD SOI for very high-speed interfaces. The PD SOI current-mode driver shows a 3 times lower data dependent jitter than the bulk current-mode driver at the same 3.125 Gbps data rate of XAUI standard.
This paper presents an experimental analysis of the harmonic distortion of asymmetric self-cascode (A-SC) association of SOI transistors. This goal is achieved by comparing the A-SC to the symmetric self-cascode (S-SC) configuration with different channel lengths. The non-linearity data have been obtained by applying the Integral Function Method to experimental measurements, for the evaluation of the total and third-order harmonic distortion. The results show that the asymmetric self-cascode provides lower total harmonic distortion than S-SC for all studied channel length associations. If a target distortion level is fixed, the A-SC enables an increase of input signal amplitude. On the other hand, smaller input signal amplitude and distortion are verified in the A-SC when fixing the output amplitude.
This paper presents an analysis on the linearity of Asymmetric Self-Cascode (A-SC) of FD SOI nMOSGET transistors at cryogenic temperatures. This is achieved by evaluating experimental results of associations of transistors with various combinations of channel doping, obtained at temperatures ranging between liquid helium temperature (LHT, 4K) and room temperature (300K). It has been observed that A-SC presents better analog characteristics than the Symmetric Self-Cascode (S-SC) even at temperatures below 100K. The results show improved harmonic distortion at cryogenic temperatures and for structures composed by transistors with lower channel doping.
Thin film fully depleted silicon-on-insulator CMOS technology, devices and circuits for RF applications are presented. These submicron MOSFET transistors can achieve a maximum oscillation frequency of 30 GHz for a 1 V power supply. This kind of performance and the advantages of the SOI transistors fit the needs for low-voltage low-power RF applications. To demonstrate the capabilities of this technology we present a single stage OTA with a f/sub T/ of 1.1 GHz and /spl phi//sub M/ of 30/spl deg/, and two CMOS mixers with exceptional linearity results.
In this paper the analog performance of Graded-Channel (GC) SOI nMOSFETs with deep submicrometer channel length is presented. Experimental data of GC transistors fabricated in an industrial 150 nm fully-depleted SOI technology from OKI Semiconductorswere used to adjust the two-dimensional numerical simulations, in order to analyze the devices analog behavior by extrapolating their physical parameters. The obtained results show that the larger intrinsic voltage gain improvement occurs when the length of the lightly doped region is approximately 100 nm regardless the total channel length, doping concentration and temperature.
This paper presents an ultra-low power CMOS voltage reference circuit which is robust under biomedical extreme conditions, such as high temperature and high total ionized dose (TID) radiation. To achieve such performances, the voltage reference is designed in a suitable 130 nm Silicon-on-Insulator (SOI) industrial technology and is optimized to work in the subthreshold regime of the transistors. The design simulations have been performed over the temperature range of -40-200 °C and for different process corners. Robustness to radiation was simulated using custom model parameters including TID effects, such as mobilities and threshold voltages degradation. The proposed circuit has been tested up to high total radiation dose, i.e., 1 Mrad (Si) performed at three different temperatures (room temperature, 100 °C and 200 °C). The maximum drift of the reference voltage V(REF) depends on the considered temperature and on radiation dose; however, it remains lower than 10% of the mean value of 1.5 V. The typical power dissipation at 2.5 V supply voltage is about 20 μW at room temperature and only 75 μW at a high temperature of 200 °C. To understand the effects caused by the combination of high total ionizing dose and temperature on such voltage reference, the threshold voltages of the used SOI MOSFETs were extracted under different conditions. The evolution of V(REF) and power consumption with temperature and radiation dose can then be explained in terms of the different balance between fixed oxide charge and interface states build-up. The total occupied area including pad-ring is less than 0.09 mm2.
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